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CsKSi4NiO10

Alexandria ALEX

Alex-ID: agm011014192 · 空间群: P-1 (#2)

基础信息

化学式
CsKSi4NiO10
Alex-ID
agm011014192
元素数
5
位点数
34
空间群
P-1 (#2)
晶系
triclinic
体积
522.41
ų
晶胞参数 a
7.2162
Å
晶胞参数 b
8.5527
Å
晶胞参数 c
10.1531
Å
α 角
107.38
°
β 角
102.03
°
γ 角
110.95
°

组成

元素组成(原子分数)
组成信息
化学式
CsKSi4NiO10
Cs
2.00 · 5.9%
K
2.00 · 5.9%
Si
8.00 · 23.5%
Ni
2.00 · 5.9%
O
20.00 · 58.8%

能量与稳定性

凸包上方能量
0.0041
eV/atom
形成能
-2.8170
eV/atom
校正后总能量
-253.8114
eV
原始总能量
-235.4376
eV

电子结构

间接带隙
4.0209
eV
直接带隙
4.0563
eV
费米能级态密度
0.0000
总磁矩
4.1786
μB

其他信息

原型 ID

ABCD4E10_0_spg2

分解产物

K2Si4NiO10 Cs2Si4NiO10

计算时间

2024-12-11 06:10:52

引用参考

Alexandria 官方页面
https://alexandria.icams.rub.de/
参考引用

The crystal structure and related material properties of this entry were obtained from the Alexandria database (Alex-ID: agm011014192).

文献引用

Th. Cavignac, J. Schmidt, P.-P. De Breuck, A. Loew, T. F. T. Cerqueira, H.-C. Wang, A. Bochkarev, Y. Lysogorskiy, A. H. Romero, R. Drautz, S. Botti and M. A. L. Marques. AI-Driven expansion and application of the Alexandria database. J. Phys. Mater. 9, 025014 (2026). https://doi.org/10.1088/2515-7639/ae6620

BibTeX
@article{Cavignac2026Alexandria,
  author  = {Cavignac, Th{\'e}o and Schmidt, Jonathan and De Breuck, Pierre-Paul and Loew, Antoine
             and Cerqueira, Tiago F. T. and Wang, Hai-Chen and Bochkarev, Anton
             and Lysogorskiy, Yury and Romero, Aldo H. and Drautz, Ralf and Botti, Silvana
             and Marques, Miguel A. L.},
  title   = {{AI}-Driven expansion and application of the {A}lexandria database},
  journal = {Journal of Physics: Materials},
  year    = {2026},
  volume  = {9},
  number  = {2},
  pages   = {025014},
  doi     = {10.1088/2515-7639/ae6620},
  url     = {https://doi.org/10.1088/2515-7639/ae6620}
}

晶体结构 3D 渲染

加载 3D 结构...

样式: Ball & Stick
原始 CIF 数据
# CIF generated by HEAS from Alexandria entry agm011014192
data_agm011014192
_cell_length_a     7.21618
_cell_length_b     8.55271
_cell_length_c     10.15309
_cell_angle_alpha  107.37810
_cell_angle_beta   102.03111
_cell_angle_gamma  110.94566
_cell_volume       522.41259
_symmetry_space_group_name_H-M 'P 1'
_symmetry_Int_Tables_number 1
loop_
_symmetry_equiv_pos_as_xyz
  'x, y, z'
loop_
_atom_site_label
_atom_site_type_symbol
_atom_site_fract_x
_atom_site_fract_y
_atom_site_fract_z
_atom_site_occupancy
  Cs1 Cs 0.16921 0.82206 0.99051 1.00000
  Cs2 Cs 0.83079 0.17794 0.00949 1.00000
  K1 K 0.84082 0.85101 0.59774 1.00000
  K2 K 0.15918 0.14899 0.40226 1.00000
  Si1 Si 0.50342 0.33751 0.22903 1.00000
  Si2 Si 0.49658 0.66249 0.77097 1.00000
  Si3 Si 0.04640 0.34651 0.72053 1.00000
  Si4 Si 0.95360 0.65349 0.27947 1.00000
  Si5 Si 0.33125 0.20353 0.87349 1.00000
  Si6 Si 0.66875 0.79647 0.12651 1.00000
  Si7 Si 0.63288 0.35680 0.72839 1.00000
  Si8 Si 0.36712 0.64320 0.27161 1.00000
  Ni1 Ni 0.36597 0.91004 0.59439 1.00000
  Ni2 Ni 0.63403 0.08996 0.40561 1.00000
  O1 O 0.60396 0.52928 0.70059 1.00000
  O2 O 0.39604 0.47072 0.29941 1.00000
  O3 O 0.55305 0.34635 0.86817 1.00000
  O4 O 0.44695 0.65365 0.13183 1.00000
  O5 O 0.92269 0.19324 0.55641 1.00000
  O6 O 0.07731 0.80676 0.44359 1.00000
  O7 O 0.14022 0.26441 0.83268 1.00000
  O8 O 0.85978 0.73559 0.16732 1.00000
  O9 O 0.89076 0.42076 0.79157 1.00000
  O10 O 0.10924 0.57924 0.20843 1.00000
  O11 O 0.24578 0.53212 0.73804 1.00000
  O12 O 0.75422 0.46788 0.26196 1.00000
  O13 O 0.37644 0.23385 0.04771 1.00000
  O14 O 0.62356 0.76615 0.95229 1.00000
  O15 O 0.47010 0.18530 0.29372 1.00000
  O16 O 0.52990 0.81470 0.70628 1.00000
  O17 O 0.73748 0.00429 0.23076 1.00000
  O18 O 0.26252 0.99571 0.76924 1.00000
  O19 O 0.49065 0.83605 0.41423 1.00000
  O20 O 0.50935 0.16395 0.58577 1.00000
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